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No. 1117 |
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Status of Advanced Lithography Technology |
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Advanced Lithography Technology Committee |
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Immersion Lithography, EUV Lithography, EB Lithography, Nano-imprint |
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Advanced lithography technology for half pitch (hp) 45nm semiconductor device manufacturing has introduced ArF immersion tools in mass production, and has focused on hp 32nm lithography technology development as a next target. The next generation lithography technology candidates are double patterning technology, EUV (Extreme Ultra Violet) lithography technology, and nano-imprint technology. In this advanced lithography technology committee, we investigate the status of those lithography technologies, and evaluate the most promising candidates for the next generation lithography technology. |
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©2007. The Institute of Electrical Engineers of Japan |